[PDF.28zw] Polymers for Microelectronics: Resists and Dielectrics (ACS Symposium Series)

Polymers for Microelectronics: Resists and Dielectrics (ACS Symposium Series)

[PDF.nf70] Polymers for Microelectronics: Resists and Dielectrics (ACS Symposium Series)

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 | #8732986 in Books |  American Chemical Society |  1994-05-05 | Original language:English | PDF # 1 |  6.00 x1.30 x8.90l,1.95 | File type: PDF | 554 pages

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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.

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